SICK Sensor Intelligence



• Volume Flow Measurement
• Gas Analysis
• Process control in chemical production
• Raw gas monitoring in waste incineration
• Monitoring of flue gas conditioning

FLOWSIC100 EX-PR


Reliable gas flow measurement for flare gas applications. At the FLOWSIC100 Flare devices the ultrasonic transducer is embedded in a flow optimized probe. The unique design reduces flow noise and signal drift to a minimum. Therefore, the FLOWSIC100 Flare devices suits excellent for measurements at very high gas velocities, and gives stable and reliable measurements.

Applications
* Emission control as accounting for CO2 taxes
* Detection of flare gas leakages and gas identification
* Optimizing of steam usage at flaregas combustion
* Control of gas wastage
* Accurate mass balance calculation and process optimization

Sick North America

Products and Customer Support for Analysis and Process Instrumentation.
Especially in the field of analyzers and process instrumentation, fewer people must handle at least the same if not more demanding tasks. Stricter regulations and technological advances lead to higher instrument requirements while. Last but not least, the going-global of the main users of process automation is forcing us as supplier to be sufficiently present and organized to meet their needs locally.

Simultaneous process monitoring of up to 6 measuring components


MCS300P The MCS300P is an extractive process photometer for measurement of gaseous or liquid media. It measures IR- and VIS-active components with variable measuring ranges from very low (ppm) to high (vol%) concentrations. For monitoring of toxic or flammable mixtures, it has special process cuvettes with safety devices like twin-seals and purge gas feeds. The heatable cuvettes made of corrosive-resistant materials have a high pressure resistance. An automatic adjustment device an innovative operation concept and modern communication protocols make the MCS300P an all-purpose photometer, also for potentially explosive atmospheres.

Applications

Process control in chemical production, e.g. of vinylchloride, isocyanate, polycarbonate, acrylic acid, adipic acid
Raw gas monitoring in waste incineration
Monitoring of flue gas conditioning

Measuring principle
gas filter correlation, interference filter correlation

Measuring components
(C2H5)3N, (CH3)3SiCl, Br2, C2Cl4, C2H2, C2H2Cl2, C2H3Cl, C2H4, C2H4Cl2, C2H5OH, C2H6, C2HBrClF3, C2HCl3, C3F5ClOH, C3F6, C3F6O, C3H6, C3H7OH, C3H8, C4H10, C4H8, C4H9NH3, C6H4Cl2, C6H5CHO, C6H5Cl, C6H5NO2, CCl2F2, CCl4, CH2Cl2, CH3CHO, CH3COOC2H3, CH4, CHCl3, CHClF2, Cl2, CO, CO2, COCl2, COS, CS2, H2O, HCl, HCN, HF, N2O, NH3, NO, NO2, SF6, SiF4, SO2, UF6